Advances and Challenges in Developable Bottom Anti-Reflective Coating (DBARC)
نویسندگان
چکیده
منابع مشابه
Humidity Induced Defect Generation and Its Control during Organic Bottom Anti-reflective Coating in the Photo Lithography Process of Semiconductors
Defect generation during organic bottom anti-reflective coating (BARC) in the photo lithography process is closely related to humidity control in the BARC coating unit. Defects are related to the water component due to the humidity and act as a blocking material for the etching process, resulting in an extreme pattern bridging in the subsequent BARC etching process of the poly etch step. In thi...
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Bottom anti-reflective coatings (BARCs) are essential for achieving the 65-nm node resolution target by minimizing the substrate reflectivity to less than 1% and by planarizing substrates. We believe that the developments in 157-nm BARC products are on track to make them available for timely application in 157-nm lithography. We have made some significant improvements in resist compatibility an...
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Several investigations have been devoted towards understanding the coating process in fluidized beds. Most of these studies focused on spraying liquid droplets over the bed. However, due to the complexity of these systems, more investigations are still required to quantify the effect of operating conditions on the coating criteria. The present work aims at fundamentally understanding and pr...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2010
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.23.731